The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2018

Filed:

Oct. 17, 2013
Applicants:

Sharp Kabushiki Kaisha, Osaka-shi, Osaka, JP;

Toyo Gosei Co., Ltd., Ichikawa-shi, Chiba, JP;

Inventors:

Masanobu Mizusaki, Osaka, JP;

Youhei Nakanishi, Osaka, JP;

Takeshi Noma, Osaka, JP;

Satoshi Enomoto, Inzai, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 19/56 (2006.01); C09K 19/20 (2006.01); C09K 19/52 (2006.01); C08F 22/36 (2006.01); C08F 222/36 (2006.01); C07C 69/602 (2006.01); C07C 233/55 (2006.01); G02F 1/1337 (2006.01); C07C 233/27 (2006.01); C09K 19/04 (2006.01); C08F 222/10 (2006.01); G02F 1/1341 (2006.01);
U.S. Cl.
CPC ...
C09K 19/56 (2013.01); C07C 69/602 (2013.01); C07C 233/27 (2013.01); C07C 233/55 (2013.01); C08F 22/36 (2013.01); C08F 222/36 (2013.01); C09K 19/20 (2013.01); C09K 19/52 (2013.01); G02F 1/133788 (2013.01); C08F 2222/102 (2013.01); C09K 2019/0448 (2013.01); G02F 1/1341 (2013.01); G02F 1/133711 (2013.01);
Abstract

An aspect of the present invention provides a monomer from which a polymer layer capable of keeping high display quality even in high temperature and high humidity environments can be formed. The monomer in an aspect of the present invention is a compound represented by P-Sp-Z-A-(Z-A)-Z-Sp-P: in the formula, P denotes the same or different radical polymerizable group; and at least one of Z, Z, and Zdenotes —NRCO— or —CONR— group.


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