The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2018
Filed:
Jan. 17, 2017
Nanotek Instruments, Inc., Dayton, OH (US);
Aruna Zhamu, Centerville, OH (US);
Bor Z. Jang, Centerville, OH (US);
Yanbo Wang, Xenia, OH (US);
Lucy Fu, Centerville, OH (US);
Nanotek Instruments, Inc., Dayton, OH (US);
Abstract
A process for producing a highly oriented graphene film, comprising: (a) preparing a pristine graphene dispersion having oxygen-free pristine graphene sheets dispersed in a fluid medium; (b) dispensing and depositing the dispersion onto a supporting substrate to form a layer of oriented pristine graphene, including subjecting the pristine graphene dispersion to an orientation-inducing stress; (c) removing the fluid medium to form a dried layer of pristine graphene; (d) stacking at least two layers of dried pristine graphene to form a mass of multiple layers of dried pristine graphene; and (e) heat treating the mass of multiple layers of dried pristine graphene at a first heat treatment temperature higher than 2,000° C. under a compressive stress for a sufficient period of time to produce the highly oriented graphene film.