The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2018
Filed:
Jun. 23, 2017
Applicant:
Nanoco Technologies Ltd., Manchester, GB;
Inventors:
Assignee:
Nanoco Technologies Ltd., Manchester, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B82Y 40/00 (2011.01); C01G 39/06 (2006.01); H01L 31/18 (2006.01); H01L 31/0384 (2006.01); H01L 31/032 (2006.01); C09D 11/037 (2014.01); C09D 11/52 (2014.01); B01J 13/00 (2006.01); B82Y 20/00 (2011.01); C09D 11/322 (2014.01);
U.S. Cl.
CPC ...
B82Y 40/00 (2013.01); B01J 13/00 (2013.01); C01G 39/06 (2013.01); C09D 11/037 (2013.01); C09D 11/322 (2013.01); C09D 11/52 (2013.01); H01L 31/032 (2013.01); H01L 31/03845 (2013.01); H01L 31/18 (2013.01); B82Y 20/00 (2013.01); C01P 2004/24 (2013.01); C01P 2006/40 (2013.01); Y10S 977/759 (2013.01); Y10S 977/825 (2013.01); Y10S 977/888 (2013.01); Y10S 977/954 (2013.01);
Abstract
A method of synthesis of two-dimensional (2D) nanoflakes comprises the cutting of prefabricated nanoparticles. The method allows high control over the shape, size and composition of the 2D nanoflakes, and can be used to produce material with uniform properties in large quantities. Van der Waals heterostructure devices are prepared by fabricating nanoparticles, chemically cutting the nanoparticles to form nanoflakes, dispersing the nanoflakes in a solvent to form an ink, and depositing the ink to form a thin film.