The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2018
Filed:
Nov. 17, 2016
Applicant:
Seagate Technology Llc, Cupertino, CA (US);
Inventors:
Daniel Richard Buettner, Savage, MN (US);
Andrew David Habermas, Bloomington, MN (US);
Daniel Sullivan, Carver, MN (US);
Joseph M. Stephan, Eden Prairie, MN (US);
Assignee:
Seagate Technology LLC, Cupertino, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/60 (2006.01); B05D 3/06 (2006.01); B05D 3/12 (2006.01); B33Y 10/00 (2015.01); B33Y 80/00 (2015.01); B05D 7/00 (2006.01); B29C 59/02 (2006.01); G11B 5/31 (2006.01);
U.S. Cl.
CPC ...
B05D 3/067 (2013.01); B05D 3/12 (2013.01); B05D 7/54 (2013.01); B29C 59/02 (2013.01); B33Y 10/00 (2014.12); B33Y 80/00 (2014.12); G11B 5/3163 (2013.01); G11B 5/6005 (2013.01); G11B 5/6082 (2013.01); B29C 2059/023 (2013.01); Y10T 29/49041 (2015.01);
Abstract
The present disclosure includes methods of forming air bearing surfaces having multi-tier structures using nanoimprint technology and/or 3D printing technology. In some embodiments, a single stage of milling can be used to transfer a multi-tier photoresist pattern into a substrate (e.g., an AlTiC substrate).