The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 21, 2018

Filed:

Oct. 26, 2015
Applicant:

Murata Manufacturing Co., Ltd., Kyoto, JP;

Inventors:

Takayuki Imada, Kyoto, JP;

Takayuki Tsukizawa, Kyoto, JP;

Jun Adachi, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05F 3/00 (2006.01); H05F 3/04 (2006.01); H01T 4/10 (2006.01); H01T 1/22 (2006.01); H05K 9/00 (2006.01); H01T 4/12 (2006.01); H05K 1/02 (2006.01); H05K 1/03 (2006.01); H05K 1/09 (2006.01); H05K 3/12 (2006.01); H05K 3/46 (2006.01);
U.S. Cl.
CPC ...
H05F 3/04 (2013.01); H01T 1/22 (2013.01); H01T 4/10 (2013.01); H05K 1/026 (2013.01); H05K 9/0067 (2013.01); H01T 4/12 (2013.01); H05K 1/0259 (2013.01); H05K 1/0306 (2013.01); H05K 1/092 (2013.01); H05K 3/1291 (2013.01); H05K 3/4629 (2013.01); H05K 2201/0209 (2013.01); H05K 2203/308 (2013.01);
Abstract

There is provided an ESD protection device capable of lowering a discharge starting voltage. An ESD protection deviceincludes a ceramic multilayer substrate, a first discharge electrodeand a second discharge electrodearranged at a height position of the ceramic multilayer substrate, an endof the first discharge electrodeand an endof the second discharge electrodefacing each other, in which each of the first discharge electrodeand the second discharge electrodecontains a metal and a shrinkage suppression material having a lower rate of shrinkage than that of the metal at a temperature at which firing for the production of the ceramic multilayer substrateis performed.


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