The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 21, 2018

Filed:

Feb. 28, 2017
Applicant:

Sandisk Technologies Llc, Plano, TX (US);

Inventors:

Xiying Costa, San Jose, CA (US);

Daxin Mao, Cupertino, CA (US);

Christopher Petti, Mountain View, CA (US);

Dana Lee, Saratoga, CA (US);

Yao-Sheng Lee, Tampa, FL (US);

Assignee:

SANDISK TECHNOLOGIES LLC, Addison, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/115 (2017.01); H01L 27/11524 (2017.01); H01L 27/11556 (2017.01); H01L 27/1157 (2017.01); H01L 27/11582 (2017.01); H01L 27/11519 (2017.01); H01L 27/11565 (2017.01);
U.S. Cl.
CPC ...
H01L 27/11524 (2013.01); H01L 27/1157 (2013.01); H01L 27/11519 (2013.01); H01L 27/11556 (2013.01); H01L 27/11565 (2013.01); H01L 27/11582 (2013.01);
Abstract

A three-dimensional memory device includes a first alternating stack of first insulating layers and first electrically conductive layers, a first memory opening fill structure extending through the first alternating stack and including a first memory film and a first vertical semiconductor channel, a joint-level electrically conductive layer overlying the first alternating stack, at least one joint-level doped semiconductor portion contacting a top surface of the first vertical semiconductor channel and located within, and electrically isolated from, the joint-level electrically conductive layer, a second alternating stack of second insulating layers and second electrically conductive layers located over the joint-level electrically conductive layer, and a second memory opening fill structure extending through the second alternating stack and including a second memory film and a second vertical semiconductor channel that is laterally surrounded by the second memory film and vertically extends into the at least one joint-level doped semiconductor portion.


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