The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2018
Filed:
Jul. 29, 2015
Oxford Instruments Nanotechnology Tools Limited, Oxon, GB;
Peter Statham, Buckinghamshire, GB;
Abstract
A method is provided of measuring the mass thickness of a target sample for use in electron microscopy. Reference data are obtained which is representative of the X-rays () generated within a reference sample () when a particle beam () is caused to impinge upon a region () of the reference sample (). The region () is of a predetermined thickness of less than 300 nm and has a predetermined composition. The particle beam () is caused to impinge upon a region () of the target sample (). The resulting X-rays () generated within the target sample () are monitored () so as to produce monitored data. Output data are then calculated based upon the monitored data and the reference data, the output data including the mass thickness of the region () of the target sample ().