The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 21, 2018

Filed:

May. 20, 2016
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Beijing Boe Display Technology Co., Ltd., Beijing, CN;

Inventors:

Wei Zhang, Beijing, CN;

Yu Zhang, Beijing, CN;

Hao Zhou, Beijing, CN;

Yanping Liao, Beijing, CN;

Weihao Hu, Beijing, CN;

Hai Chi, Beijing, CN;

Wei Zhong, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 21/14 (2006.01); F21K 9/20 (2016.01); F21K 9/68 (2016.01); G02B 5/02 (2006.01); G02F 1/1335 (2006.01);
U.S. Cl.
CPC ...
F21K 9/20 (2016.08); F21K 9/68 (2016.08); F21V 21/14 (2013.01); G02B 5/0278 (2013.01); G02F 1/133602 (2013.01);
Abstract

A direct-type backlight optical simulation apparatus and system are provided. The apparatus includes a diffusion plate, a supporting plate for the diffusion plate, an MF device and a platform, a side wall and a supporting rack for the diffusion plate are formed around the platform, and the platform includes slides, a reflection sheet and a plurality of first guide rails arranged to be parallel to each other. The MF device includes an MF fixing device, an MF reflection plate and an MF angle adjustment device. The MF reflection plate is coupled with the MF fixing device by the MF angle adjustment device, and the MF device is fixed on the side walls of the platform by the MF fixing device.


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