The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2018
Filed:
Sep. 22, 2016
Min Aik Technology Co., Ltd., Taoyuan, TW;
MIN AIK TECHNOLOGY CO., LTD., Taoyuan, TW;
Abstract
A polyoxymethylene composition includes a polyoxymethylene copolymer with 1,3-dioxolane as a comonomer, a wear resistance agent, a nucleating agent, and an antistatic agent. A ramp is made of the polyoxymethylene composition. The ramp and the polyoxymethylene have excellent low-wear-debris property. The low wear debris polyoxymethylene composition can be used to produce a ramp for many different designs of hard disks, such as PMR (perpendicular recording)+TDMR (Two-Dimensional Magnetic Recording), SMR (Shingled Magnetic Recording), HAMR(HAMR (Heat Assisted Magnetic Recording)+SMR+TDMR), BPMR(BPMR (Bit Pattern Media Recording)+SMR+TDMR), and helium-filled hard disk.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile