The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2018
Filed:
Mar. 05, 2012
Jonathan T. Butcher, Ithaca, NY (US);
Kevin H. Kang, Ithaca, NY (US);
Kevin Yeh, Corvallis, OR (US);
Philip Yue-cheng Cheung, Phoenix, AZ (US);
Laura A. Hockaday, Ithaca, NY (US);
Jonathan T. Butcher, Ithaca, NY (US);
Kevin H. Kang, Ithaca, NY (US);
Kevin Yeh, Corvallis, OR (US);
Philip Yue-cheng Cheung, Phoenix, AZ (US);
Laura A. Hockaday, Ithaca, NY (US);
CORNELL UNIVERSITY, Ithaca, NY (US);
Abstract
A method for specifying and fabricating non-homogeneous, anisotropic, truly functionally graded objects. The objects may have defined spatial heterogeneity (e.g., a gradient in material concentration) with local randomized distributions. This local randomness is designed in such a way that global averaging results in the specified spatial heterogeneity. The fabrication of structures is an additive process in which a material is deposited in defined patterns.