The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 14, 2018

Filed:

Nov. 07, 2017
Applicant:

Nikon Corporation, Tokyo, JP;

Inventor:

Kazuya Ono, Saitama, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/42 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/706 (2013.01); G03F 7/707 (2013.01); G03F 7/7085 (2013.01); G03F 7/70266 (2013.01); G03F 7/70341 (2013.01); G03F 7/70591 (2013.01); G03F 7/70716 (2013.01); G03F 7/70825 (2013.01);
Abstract

An exposure apparatus includes a stage apparatus having an upper surface in which a recess that holds a substrate is formed. A liquid immersion system has a supply port via which a liquid is supplied and a collection port via which the liquid is collected forms a liquid immersion region. A projection optical system has an optical element and is configured to project an exposure light onto the substrate through the liquid of the liquid immersion region. A light-transmissive member is provided at the stage apparatus and has an upper surface substantially coplanar with an upper surface of the substrate held on the stage apparatus and with the upper surface of the stage apparatus. A groove is provided at the stage apparatus, into which the liquid is allowed to flow.


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