The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2018
Filed:
Mar. 30, 2016
Applicant:
Industrial Technology Research Institute, Hsinchu, TW;
Inventors:
Yaw-Ting Wu, Zhubei, TW;
Ping-Chen Chen, Taipei, TW;
Assignee:
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE, Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); C09D 133/14 (2006.01); C09D 133/16 (2006.01); C08L 63/04 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); C08L 63/04 (2013.01); C09D 133/14 (2013.01); C09D 133/16 (2013.01);
Abstract
A photo-imprinting resin composition, a photo-imprinting resin film and a patterning process are provided. The photo-imprinting resin composition includes a novolac resin; a monomer having acrylic group, a polymer having acrylic group or a combination thereof; and a radical type photopolymerization initiator. The novolac resin has a Mw of 500 to 50000. The novolac resin does not react with the monomer having acrylic group nor the polymer having acrylic group described above.