The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2018
Filed:
Jul. 21, 2014
Canon Kabushiki Kaisha, Tokyo, JP;
Hiroshi Sato, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
Arrangement information regarding shot areas is obtained in an imprinting method. When a pattern is sequentially formed in the shot areas, the attraction force of a first attraction area is reduced to less than that of the second attraction area. After the pattern is formed in the shot area corresponding to the first attraction area, the attraction forces of the first and second attraction areas are changed. The position information regarding the shot area corresponding to the second attraction area is obtained, which is compared with the position information regarding the shot area corresponding to the second attraction area based on the arrangement information. If the difference between the compared position information is a threshold value or less, positioning of a substrate and a mold is achieved using the arrangement information. If the difference is greater than the threshold value, the arrangement information regarding the shot areas is obtained again.