The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 14, 2018

Filed:

Sep. 04, 2015
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Sung-Won Cho, Hwaseong-si, KR;

Jung-Ha Son, Seoul, KR;

Su-Bin Bae, Gyeongsan-si, KR;

Yun-Jong Yeo, Seoul, KR;

Joo-Hyung Lee, Seongnam-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); C09K 13/00 (2006.01); C23F 4/00 (2006.01); H01L 21/311 (2006.01); H01L 21/308 (2006.01); H01L 21/3105 (2006.01); H01L 21/3065 (2006.01); H01L 21/306 (2006.01); B81C 1/00 (2006.01); G02F 1/1335 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3058 (2013.01); C09K 13/00 (2013.01); C23F 4/00 (2013.01); B81C 1/00388 (2013.01); B81C 1/00404 (2013.01); B81C 2201/0149 (2013.01); G02F 2001/133548 (2013.01); G03F 7/0041 (2013.01); H01L 21/3065 (2013.01); H01L 21/3081 (2013.01); H01L 21/3088 (2013.01); H01L 21/30604 (2013.01); H01L 21/31056 (2013.01); H01L 21/31111 (2013.01); H01L 21/31116 (2013.01);
Abstract

A method of manufacturing a polarizer includes forming a first layer on a base substrate, forming a first partition wall layer on the first layer, forming a second partition wall layer on the first partition wall, forming a plurality of first partition wall patterns and a plurality of second partition walls disposed on the first partition wall patterns by etching the first partition wall and the second partition wall at the same time, forming a block copolymer layer on the first layer on which the plurality of first partition wall patterns are formed, forming a plurality of fine patterns from the block copolymer layer, and patterning the first layer using the fine patterns and the second partition wall patterns as a mask.


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