The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2018
Filed:
Jan. 30, 2015
Swen Campagna, Engelthal, DE;
Wilfried Landschutz, Baiersdorf, DE;
Michael Wullenweber, Erlangen, DE;
Swen Campagna, Engelthal, DE;
Wilfried Landschutz, Baiersdorf, DE;
Michael Wullenweber, Erlangen, DE;
Siemens Aktiengesellschaft, München, DE;
Abstract
The embodiments relate to a method for the optimization of alignment measurements in which a MR facility is configured to a measurement object. First alignment measurements are carried out while the measurement object is being moved through the MR facility, wherein at least one MR system parameter of the MR facility is configured to the measurement object of the first alignment measurements. A second alignment measurement is also carried out in which the measurement object is stationary in a fixed position in the MR facility, wherein the second alignment measurement includes an iterative alignment method in which the at least one MR system parameter for the recording of MR signals of the measurement object is iteratively configured to the measurement object in the fixed position in the MR facility, wherein for the iterative alignment method the aligned MR system parameter is chosen from the aligned MR system parameters.