The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 14, 2018

Filed:

Sep. 26, 2013
Applicant:

Osram Gmbh, Munich, DE;

Inventors:

Ales Markytan, Regensburg, DE;

Christian Gärtner, Regensburg, DE;

Horst Varga, Lappersdorf, DE;

Jan Marfeld, Regensburg, DE;

Janick Ihringer, Regensburg, DE;

Manfred Scheubeck, Pulau Pinang, MY;

Roland Schulz, Regensburg, DE;

Alexander Linkov, Regensburg, DE;

Assignee:

OSRAM GmbH, München, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 5/08 (2006.01); F21V 7/09 (2006.01); F21K 99/00 (2016.01); F21V 7/00 (2006.01); H01L 33/58 (2010.01); F21K 9/60 (2016.01); F21Y 115/10 (2016.01);
U.S. Cl.
CPC ...
F21K 9/50 (2013.01); F21K 9/60 (2016.08); F21V 5/08 (2013.01); F21V 7/0066 (2013.01); F21V 7/0091 (2013.01); H01L 33/58 (2013.01); F21Y 2115/10 (2016.08); H01L 2924/0002 (2013.01);
Abstract

An optical element is provided for beam shaping for radiation emitted by a radiation-emitting semiconductor chip. The optical element includes a radiation entrance face and a boundary surface different from the radiation entrance face with a first region and a second region. The first and second regions are arranged and embodied such that a first radiation portion of radiation entering the optical element through the radiation entrance face is reflected in the first region and after reflection in the first region is deflected in the second region towards a plane defined by the radiation entrance face.


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