The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2018
Filed:
Dec. 11, 2014
Indian Institute of Technology Madras, Tamil Nadu, IN;
Jitendra Sangwai, Mehekar, IN;
INDIAN INSTITUTE OF TECHNOLOGY MADRAS, Tamil Nadu, IN;
Abstract
Gas hydrate slurry formation systems are provided. The gas hydrate slurry formation system includes a cavitation chamber configured to receive a fluid and a cavitation device placed within the cavitation chamber. The cavitation device is configured to form a plurality of bubbles within the fluid in the cavitation chamber. The gas hydrate slurry formation system also includes a gas inlet configured to introduce a gas within the cavitation chamber such that the gas is entrained in the plurality of bubbles to form a plurality of gas-entrained bubbles. The plurality of gas-entrained bubbles implode within the cavitation chamber to form a gas hydrate slurry.