The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2018
Filed:
Sep. 22, 2017
SK Innovation Co., Ltd., Seoul, KR;
Korea Advanced Institute of Science and Technology, Daejeon, KR;
Jin Su Ham, Daejeon, KR;
Yeon Sik Jung, Daejeon, KR;
Sun Young Kim, Daejeon, KR;
Yoon Hyung Hur, Daejeon, KR;
Kwang Kuk Lee, Daejeon, KR;
Seung Won Song, Daejeon, KR;
SK Innovation Co., Ltd., Seoul, KR;
Korea Advanced Institute of Science and Technology, Daejeon, KR;
Abstract
Provided is a method of forming fine patterns capable of minimizing LER and LWR to form high quality nanopatterns, by using a block copolymer having excellent etching selectivity. Provided is a block copolymer comprising a first block having a repeating unit represented by the following Chemical Formula 1, and a second block having a repeating unit represented by the following Chemical Formula 2: