The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 14, 2018

Filed:

Feb. 26, 2016
Applicant:

Sogang University Research Foundation, Seoul, KR;

Inventors:

Hee-Woo Rhee, Seoul, KR;

Sung-Min Cho, Incheon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 7/18 (2006.01); H01L 21/02 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
C07F 7/1836 (2013.01); H01L 21/02126 (2013.01); H01L 21/02203 (2013.01); H01L 21/02216 (2013.01); H01L 21/02282 (2013.01); H01L 23/5329 (2013.01);
Abstract

The present disclosure relates to a reactive porogen using cyclic organic polyol and an ultra low dielectric film prepared using the same, and more particularly, to novel cyclic organic polyol as a cyclic organic polyol compound which can be completely pyrolyzed at a temperature of 500° C. or less, does not leave carbon residue during a heat treatment if an end hydroxyl group of the cyclic organic compound is substituted by a functional group of alkylalkoxysilane and then used as a reactive porogen, and is involved in a sol-gel reaction of organic silicate and suppresses phase separation and thus forms pores having a uniform size and has excellent mechanical properties as compared with a porosity, a reactive porogen using the ash-free cyclic organic polyol, and an ultra low dielectric film prepared using the same.


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