The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 14, 2018

Filed:

Dec. 10, 2014
Applicant:

Smith International, Inc., Houston, TX (US);

Inventors:

Yahua Bao, Orem, UT (US);

Ronald K. Eyre, Orem, UT (US);

Assignee:

SMITH INTERNATIONAL, INC., Houston, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24D 18/00 (2006.01); B24D 99/00 (2010.01); E21B 10/56 (2006.01); E21B 10/55 (2006.01); E21B 10/567 (2006.01);
U.S. Cl.
CPC ...
B24D 18/0009 (2013.01); B24D 99/005 (2013.01); E21B 10/55 (2013.01); E21B 10/56 (2013.01); E21B 10/567 (2013.01);
Abstract

A method of forming a cutting element may include subjecting a first press containing at least a diamond powder-containing container and a volume of a high melting temperature non-reactive material to a first high pressure high temperature sintering condition to form a sintered polycrystalline diamond wafer including a diamond matrix of diamond grains bonded together and a plurality of interstitial spaces between the bonded together diamond grains; and subjecting a second press containing the sintered polycrystalline diamond wafer and a substrate to a second high temperature high pressure condition, thereby attaching the wafer to the substrate to form a cutting element having a polycrystalline diamond layer on the substrate.


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