The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 07, 2018

Filed:

Aug. 18, 2017
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

James Fred Salzman, Anna, TX (US);

Charles Clayton Hadsell, Farmers Branch, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 21/265 (2006.01); H01L 21/324 (2006.01); H01L 21/74 (2006.01); H01L 21/82 (2006.01); H01L 21/8249 (2006.01); H01L 21/8234 (2006.01); H01L 27/06 (2006.01); H01L 27/088 (2006.01); H01L 27/092 (2006.01); H01L 29/10 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0638 (2013.01); H01L 21/26513 (2013.01); H01L 21/324 (2013.01); H01L 21/74 (2013.01); H01L 21/82 (2013.01); H01L 21/8249 (2013.01); H01L 21/823412 (2013.01); H01L 27/0623 (2013.01); H01L 27/088 (2013.01); H01L 27/0921 (2013.01); H01L 29/0688 (2013.01); H01L 29/1079 (2013.01); H01L 29/78 (2013.01);
Abstract

An integrated circuit is formed by providing a heavily doped substrate of a first conductivity type, forming a lightly doped lower epitaxial layer of the first conductivity type over the substrate, implanting dopants of the first conductivity type into the lower epitaxial layer in an area for a shallow component and blocking the dopants from an area for a deep component, forming a lightly doped upper epitaxial layer over the lower epitaxial layer and activating the implanted dopants to form a heavily doped region. The shallow component is formed over the heavily doped region, and the deep component is formed outside the heavily doped region, extending through the upper epitaxial layer into the lower epitaxial layer.


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