The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2018
Filed:
Jan. 18, 2018
Applicant:
Himax Technologies Limited, Tainan, TW;
Inventors:
Cheng-Hung Chi, Tainan, TW;
Yi-Nung Liu, Tainan, TW;
Assignee:
HIMAX TECHNOLOGIES LIMITED, Tainan, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 21/14 (2006.01); G02B 27/09 (2006.01); G03B 21/20 (2006.01); G02B 27/42 (2006.01); G02B 27/10 (2006.01);
U.S. Cl.
CPC ...
G03B 21/206 (2013.01); G02B 27/0944 (2013.01); G02B 27/0955 (2013.01); G02B 27/1086 (2013.01); G02B 27/4233 (2013.01); G03B 21/2006 (2013.01);
Abstract
A method for projection includes: emitting an input beam to a diffractive optical element (DOE); and diffracting the input beam via the DOE with a specific fan-out angle θ and a number of fan-out points N on a surface, wherein the specific fan-out angle θ and the number of fan-out points N fit the following equation: where λ is a wavelength of the input beam, Δ is a pixel size of the DOE, and K is an integer not smaller than N.