The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 31, 2018

Filed:

Mar. 16, 2017
Applicant:

Sunasic Technologies, Inc., New Taipei, TW;

Inventors:

Chi Chou Lin, Taipei, TW;

Zheng Ping He, Taipei, TW;

Assignee:

Sunasic Technologies, Inc., New Taipei, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01); H01L 23/00 (2006.01); H01L 21/78 (2006.01); H01L 23/544 (2006.01); G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
H01L 24/06 (2013.01); G06K 9/00013 (2013.01); H01L 21/78 (2013.01); H01L 23/544 (2013.01); H01L 24/03 (2013.01); H01L 24/05 (2013.01); H01L 2223/5446 (2013.01); H01L 2224/03614 (2013.01); H01L 2224/05026 (2013.01); H01L 2224/06135 (2013.01);
Abstract

A chip with I/O pads on the peripheries and a method making the chip is disclosed. The chip includes: a substrate; a first metal layer, formed above the substrate; an inter-metal dielectric layer, formed above the first metal layer, having concave portions formed along the peripheries of the chip so that a portion of the first metal layer is exposed to form an input-output (I/O) pad in each of the concave portions which are spaced apart from each other; and a passivation layer, formed above the second metal layer without covering the concave portions so that specific circuits are formed by the first metal layer and the second metal layer, respectively. By changing the I/O pad from the top of the chip to the peripheries, the extra thickness of the packaged chip caused by wire bonding in the prior arts can be reduced.


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