The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2018
Filed:
Dec. 28, 2015
Empire Technology Development Llc, Wilmington, DE (US);
Jin Sam Kwak, Ulwang-si, KR;
Geonjung Ko, Suwon-si, KR;
Hyun Oh Oh, Seongnam-si, KR;
Ju Hyung Son, Ulwang-si, KR;
EMPIRE TECHNOLOGY DEVELOPMENT LLC, Wilmington, DE (US);
Abstract
Technologies are generally described for phase measuring profilometry (PMP) using structured light patterns based on orthogonal frequency division multiplexing (OFDM). In some examples, a composite structured light pattern generated using OFDM may be used to illuminate a surface of interest. The surface may reflect a phase-distorted version of the structured light pattern, and the phase-distorted structured light pattern may be processed to recover image and/or height information about the surface. In some embodiments, fast Fourier transform schemes may be used to generate the composite structured light pattern and process the phase-distorted structured light pattern.