The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2018
Filed:
Dec. 06, 2016
Shenzhen China Star Optoelectronics Technology Co., Ltd., Shenzhen, Guangdong, CN;
Taipi Wu, Guangdong, CN;
Shenzhen China Star Optoelectronics Technology Co., Ltd, Shenzhen, Guangdong, CN;
Abstract
A mask is provided for vapor deposition. The mask includes a plurality of effective open areas each of which includes apertures formed therein and extending therethrough to define hollow openings through which a deposition material is allowed to pass. The mask also includes ineffective areas that include solid portions located around the effective open areas. The ineffective areas include recesses formed therein such that the ineffective areas that have the same surface area as that of the effective open areas are made to have substantially the same mass as that of the effective open areas.