The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 31, 2018

Filed:

Nov. 07, 2014
Applicant:

Sharp Kabushiki Kaisha, Osaka-shi, Osaka, JP;

Inventors:

Yasushi Asaoka, Osaka, JP;

Shohei Katsuta, Osaka, JP;

Hideomi Yui, Osaka, JP;

Sho Ochi, Osaka, JP;

Tsuyoshi Maeda, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); G02B 5/02 (2006.01); G02B 5/20 (2006.01);
U.S. Cl.
CPC ...
G02B 5/0278 (2013.01); G02B 5/0236 (2013.01); G02B 5/0268 (2013.01); G02B 5/208 (2013.01); G02F 1/133504 (2013.01); G02F 1/133606 (2013.01);
Abstract

A light-control member () includes a substrate (); light-shielding layers () provided in a first area (A) on one surface () of the substrate (); a light-diffusion section () provided in an area other than the light-shielding layers () in the first area (A) and formed of light transmitting material; and a support section() provided in a second area (A) positioned on an outer side of the first area (A) on the one surface (), in which the light-diffusion section () has a light emitting end surface () in contact with the one surface () of the substrate (), a light incident end surface () opposing the light emitting end surface () and having an area greater than an area of the light emitting end surface (), and a reflective surface () which is in contact with the light emitting end surface () and the light incident end surface () and on which light incident from the light incident end surface () is reflected, and a formation area of the support section () per unit area in the second area (A) is greater than a formation area of the support section () per unit area in the first area (A).


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