The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 31, 2018

Filed:

Jun. 20, 2016
Applicant:

Captl Llc, West Lafayette, IN (US);

Inventors:

Masanobu Yamamoto, West Lafayette, IN (US);

J. Paul Robinson, West Lafayette, IN (US);

Assignee:

CAPTL LLC, West Lafayette, IN (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G01N 15/14 (2006.01); G01N 15/10 (2006.01);
U.S. Cl.
CPC ...
G01N 15/1427 (2013.01); G01N 15/147 (2013.01); G01N 15/1434 (2013.01); G01N 15/1475 (2013.01); G01N 15/1404 (2013.01); G01N 2015/1006 (2013.01); G01N 2015/144 (2013.01); G01N 2015/1409 (2013.01); G01N 2015/1413 (2013.01); G01N 2015/1452 (2013.01);
Abstract

An image flow cytometer for observing a microparticulate sample includes a flow chamber having a flow channel that permits the microparticulate sample to travel in a flow direction. An irradiation system scans an irradiation spot across a sensing area of the flow channel in a scan direction different from the flow direction. A detection system detects resultant light from the sensing area and provides a detection signal. An alignment system alters a location of the sensing area with respect to the flow chamber. A control unit causes the irradiation system to scan the irradiation spot during a first measurement interval and operates the alignment system to translate the location of the sensing area along the flow direction. The flow chamber can be mounted to a movable stage in some examples, and the alignment system can move the flow chamber substantially opposite the flow direction using the stage.


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