The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2018
Filed:
Mar. 07, 2017
Applicant:
May-hwa Enterprise Corporation, Taipei, TW;
Inventors:
Hsien-Yeh Chen, Taipei, TW;
Chih-Yu Wu, Taipei, TW;
Assignee:
MAY-HWA ENTERPRISE CORPORATION, Taipei, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 61/02 (2006.01); C09D 165/00 (2006.01); C23C 16/04 (2006.01);
U.S. Cl.
CPC ...
C08G 61/02 (2013.01); C09D 165/00 (2013.01); C23C 16/04 (2013.01); C08G 2261/11 (2013.01); C08G 2261/124 (2013.01); C08G 2261/146 (2013.01); C08G 2261/149 (2013.01); C08G 2261/1414 (2013.01); C08G 2261/312 (2013.01); C08G 2261/3326 (2013.01);
Abstract
A patterned film structure consists of a substrate and of a patterned polymeric layer which selectively covers and exposes part of the surface of the substrate. The patterned polymeric layer is selected form at least one of an unsubstituted poly-para-xylylene and a substituted poly-para-xylylene.