The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2018

Filed:

Jan. 22, 2015
Applicant:

Nippon Steel & Sumitomo Metal Corporation, Tokyo, JP;

Inventors:

Kazuhiro Takahashi, Tokyo, JP;

Taku Kagawa, Tokyo, JP;

Masanari Kimoto, Tokyo, JP;

Junko Imamura, Tokyo, JP;

Kiyonori Tokuno, Tokyo, JP;

Atsuhiko Kuroda, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 8/0228 (2016.01); C25D 9/08 (2006.01); C22C 14/00 (2006.01); C22F 1/18 (2006.01); H01M 8/0206 (2016.01); H01M 8/0215 (2016.01); H01M 8/0245 (2016.01); C23C 14/08 (2006.01); C23C 14/34 (2006.01); C23C 22/83 (2006.01); C23C 22/54 (2006.01); C23G 1/10 (2006.01); C25D 9/12 (2006.01); C25D 11/00 (2006.01); H01M 8/1018 (2016.01);
U.S. Cl.
CPC ...
H01M 8/0228 (2013.01); C22C 14/00 (2013.01); C22F 1/18 (2013.01); C22F 1/183 (2013.01); C23C 14/083 (2013.01); C23C 14/34 (2013.01); C23C 22/54 (2013.01); C23C 22/83 (2013.01); C23G 1/106 (2013.01); C25D 9/08 (2013.01); C25D 9/12 (2013.01); C25D 11/00 (2013.01); H01M 8/0206 (2013.01); H01M 8/0215 (2013.01); H01M 8/0245 (2013.01); H01M 8/1018 (2013.01); H01M 2008/1095 (2013.01); H01M 2300/0065 (2013.01);
Abstract

The composition ratio of a titanium hydride [I/(I+I)]×100 found from the maximum intensity of metal titanium (I) and the maximum intensity of the titanium hydride (I) of the X-ray diffraction peaks measured at a surface of a titanium or a titanium alloy at an incident angle to the surface of 0.3° is 55% or more, a titanium oxide film is formed on an outermost surface of the titanium or the titanium alloy, and C is at 10 atomic % or less, N is at 1 atomic % or less, and B is at 1 atomic % or less in a position where the surface has been subjected to sputtering of 5 nm with argon. The titanium oxide film is formed by performing stabilization treatment after performing passivation treatment in prescribed aqueous solutions, and has a thickness of 3 to 10 nm.


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