The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2018

Filed:

Jun. 23, 2017
Applicant:

Alpha and Omega Semiconductor Incorporated, Sunnyvale, CA (US);

Inventor:

Hideaki Tsuchiko, San Jose, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 21/265 (2006.01); H01L 21/306 (2006.01); H01L 21/8234 (2006.01); H01L 27/088 (2006.01); H01L 27/092 (2006.01); H01L 29/08 (2006.01); H01L 29/40 (2006.01); H01L 29/417 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7802 (2013.01); H01L 21/265 (2013.01); H01L 21/30604 (2013.01); H01L 21/823418 (2013.01); H01L 21/823493 (2013.01); H01L 27/088 (2013.01); H01L 27/0922 (2013.01); H01L 27/0928 (2013.01); H01L 29/0847 (2013.01); H01L 29/0878 (2013.01); H01L 29/407 (2013.01); H01L 29/41741 (2013.01); H01L 29/41766 (2013.01); H01L 29/66659 (2013.01); H01L 29/66712 (2013.01); H01L 29/66719 (2013.01); H01L 29/7809 (2013.01); H01L 29/7835 (2013.01); H01L 29/0653 (2013.01); H01L 29/086 (2013.01);
Abstract

A transistor includes a semiconductor body; a body region of a first conductivity type formed in the semiconductor body; a gate electrode formed partially overlapping the body region and insulated from the semiconductor body by a gate dielectric layer; a source region of a second conductivity type formed in the body region on a first side of the gate electrode; a trench formed in the semiconductor body on a second side of the gate electrode, the trench being lined with a sidewall dielectric layer and filled with a bottom dielectric layer and a conductive layer above the bottom dielectric layer, the conductive layer being electrically connected to the gate electrode; and a doped sidewall region of the second conductivity type formed in the semiconductor body along the sidewall of the trench where the doped sidewall region forms a vertical drain current path for the transistor.


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