The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2018
Filed:
Mar. 25, 2016
Boe Technology Group Co., Ltd., Beijing, CN;
Beijing Boe Display Technology Co., Ltd., Beijing, CN;
Liping Luo, Beijing, CN;
Huishuang Liu, Beijing, CN;
Haichen Hu, Beijing, CN;
Zengbiao Sun, Beijing, CN;
Tao Wang, Beijing, CN;
Kiyong Kim, Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
BEIJING BOE DISPLAY TECHNOLOGY CO., LTD., Beijing, CN;
Abstract
A mask, including a transparent substrate and mask patterns formed on a surface of the transparent substrate, wherein the mask patterns include a first area for forming film patterns in a display area and a second area for forming film patterns in a non-display area; both the first area and the second area are provided with a plurality of patterned sub-masks; a distribution density of the patterned sub-masks in the first area is less than a distribution density of the patterned sub-masks in the second area; each patterned sub-mask includes a first pattern for forming a source electrode of a transistor, a second pattern for forming a drain electrode of the transistor, and a slit interposed between the first pattern and the second pattern; and a width of the slit in the first area is greater than a width of the slit in the second area.