The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2018
Filed:
May. 24, 2017
Texas Instruments Incorporated, Dallas, TX (US);
Bradley David Sucher, Murphy, TX (US);
Bernard John Fischer, Richardson, TX (US);
Abbas Ali, Plano, TX (US);
TEXAS INSTRUMENTS INCORPORATED, Dallas, TX (US);
Abstract
A method for fabricating an integrated circuit (IC) includes etching trenches into a semiconductor surface of a substrate that has a mask thereon. Trench implanting using an angled implant then forms doped sidewalls of the trenches. Furnace annealing after trench implanting includes a ramp-up portion to a maximum peak temperature range of at least 975° C. and ramp-down portion, wherein the ramp-up portion is performed in a non-oxidizing ambient for at least a 100° C. temperature ramp portion with an Oflow being less than 0.1 standard liter per minute (SLM). The sidewalls and a bottom of the trench are thermally oxidized to form a liner oxide after furnace annealing to form dielectric lined trenches. The dielectric lined trenches are filled with a fill material, and overburden portions of the fill material are then removed to form filled trenches.