The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2018
Filed:
Feb. 08, 2017
Applicant:
Ramot AT Tel-aviv University Ltd., Tel-Aviv, IL;
Inventors:
Shay Elmalem, Moreshet, IL;
Emanuel Marom, Tel-Aviv, IL;
Harel Haim, Tel-Aviv, IL;
Naim Konforti, Holon, IL;
Assignee:
Ramot at Tel-Aviv University Ltd., Tel-Aviv, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 19/06 (2006.01); G02B 5/18 (2006.01); G02B 27/00 (2006.01); G02B 27/42 (2006.01); G02F 1/01 (2006.01); G01J 5/08 (2006.01); H04N 5/33 (2006.01); H04N 5/225 (2006.01); H04N 5/232 (2006.01); G06K 7/14 (2006.01); G01J 5/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/1871 (2013.01); G01J 5/0803 (2013.01); G02B 27/0075 (2013.01); G02B 27/4272 (2013.01); G02B 27/4288 (2013.01); G02F 1/0147 (2013.01); G06K 7/1413 (2013.01); G06K 19/0614 (2013.01); H04N 5/2254 (2013.01); H04N 5/23212 (2013.01); H04N 5/33 (2013.01); G01J 2005/0077 (2013.01); G02F 2203/11 (2013.01);
Abstract
An optical element is disclosed. The optical element comprises: a first phase shift mask formed on a first optical material and constituted to generate a positive phase shift, and a second phase shift mask formed on a second optical material and constituted to generate a negative phase shift, wherein the phase shift masks are arranged serially on an optical axis, and wherein a refractive index of at least one of the first and second optical materials varies with the temperature at a rate of at least 50×10per degree Kelvin.