The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2018

Filed:

Oct. 09, 2015
Applicant:

Daikin Industries, Ltd., Osaka-shi, Osaka, JP;

Inventors:

Masanori Jindou, Settsu, JP;

Yoshio Oritani, Settsu, JP;

Tomohiko Sakamaki, Sakai, JP;

Junichi Hamadate, Sakai, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F25B 39/00 (2006.01); F28F 9/02 (2006.01); F25B 39/02 (2006.01);
U.S. Cl.
CPC ...
F25B 39/00 (2013.01); F28F 9/0204 (2013.01); F28F 9/028 (2013.01); F28F 9/0243 (2013.01); F28F 9/0273 (2013.01); F25B 39/028 (2013.01);
Abstract

A refrigerant evaporator includes a plurality of vertically disposed flat tubes, and a refrigerant distribution and supply section that causes inflowing refrigerant to flow out to the plurality of flat tubes on a downstream side. The refrigerant distribution and supply section includes a refrigerant supply section having plural supply spaces, a refrigerant introduction and distribution section having an introduction space to introduce the inflowing refrigerant from a lower end side surface, and a distribution space to distribute the refrigerant, and plural connecting passages that guide the refrigerant to the supply spaces. A first flat tube communicating with a lowermost-tier supply space positioned on the lowermost side is disposed at a height position included in a height range of the introduction space, and a lowermost-tier connecting passage that guides the refrigerant to the lowermost-tier supply space is disposed at a position higher than the introduction space.


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