The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2018

Filed:

Mar. 20, 2015
Applicant:

Boe Technology Group Co., Ltd., Beijing, CN;

Inventor:

Feng Gu, Beijing, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/08 (2006.01); C03C 15/00 (2006.01);
U.S. Cl.
CPC ...
C09K 13/08 (2013.01); C03C 15/00 (2013.01);
Abstract

The invention provides an etching solution, comprising: 10 to 30 wt % of phosphoric acid; 2 to 20 wt % of nitric acid; 6 to 18 wt % of hydrofluoric acid; 5 to 10 wt % of hydrochloric acid; and water, wherein the weight percentages are based on the weight of the etching solution. The etching solution can be used for thinning the substrate in large-scale production, dissolving the precipitated impurities attached to the surface of the substrate after substrate thinning so as to remove effectively the impurities on the surface of the substrate, improve the qualified ratio and passed ratio of a product, and at the same time, provide the effective insurance for controlling the thickness of the substrate.


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