The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2018
Filed:
Oct. 11, 2013
Shimadzu Corporation, Kyoto-shi, Kyoto, JP;
Masakazu Akechi, Kyoto, JP;
Masaki Kanai, Kyoto, JP;
Takahiro Nishimoto, Kyoto, JP;
Nobuhiro Hanafusa, Kyoto, JP;
SHIMADZU CORPORATION, Kyoto, JP;
Abstract
Micro droplets are accurately placed in a reaction well. The reaction well () is formed in one surface of a well base (). A channel base () is placed on the well base (). The channel base () has, in its surface joined to the well base (), a liquid introduction channel () and a reaction well air vent channel (). The channel base () also has a recess () formed opposite to the reaction well () and recessed upward from the upper surface of the liquid introduction channel (). When viewed from above, a shoulder part () of the recess () is placed near the connection part between the reaction well () and the liquid introduction channel () and is closer to the center of the reaction well () than a shoulder part () of the reaction well ().