The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2018

Filed:

Sep. 04, 2013
Applicant:

Univation Technologies, Llc, Houston, TX (US);

Inventors:

Abarajith S. Hari, Ridgecrest, CA (US);

Bruce J. Savatsky, Kingwood, TX (US);

David M. Glowczwski, Baytown, TX (US);

Xianyi Cao, Pearland, TX (US);

Assignee:

Univation Technologies, LLC, Houston, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 25/04 (2006.01); B01J 19/00 (2006.01); G01N 11/14 (2006.01); G01N 33/44 (2006.01);
U.S. Cl.
CPC ...
B01J 19/0013 (2013.01); G01N 11/14 (2013.01); G01N 33/442 (2013.01); B01J 2219/00051 (2013.01); G01N 2430/60 (2013.01);
Abstract

Methods and systems for controlling a polymerization reactor in a non-sticking regime are disclosed. An exemplary method includes measuring parameters for the polymerization reaction including a reactor temperature and a concentration of an induced condensing agent (ICA) in a polymerization reactor. An equivalent partial pressure ((PICA)equiv) of the ICA is calculated. The polymerization reactor operation is located in a two dimension space defined by a reactor temperature dimension and a ((PICA)equiv) dimension. The location in the two dimensional space is compared to an non-sticking regime, defined as the space between an upper temperature limit (UTL) curve and a lower temperature limit (LTL) curve. Parameters of the polymerization reactor are adjusted to keep the reactor within the non-sticking regime.


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