The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2018

Filed:

Apr. 30, 2015
Applicant:

Korea Institute of Machinery & Materials, Daejeon, KR;

Inventors:

Hyung Cheoul Shim, Daejeon, KR;

Seung Min Hyun, Daejeon, KR;

Sunghwan Chang, Daejeon, KR;

Jeong Hwan Kim, Daejeon, KR;

Jun-ho Jeong, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/04 (2006.01); H01M 4/66 (2006.01); H01G 11/36 (2013.01); H01G 11/26 (2013.01); H01G 11/86 (2013.01); H01G 11/54 (2013.01); H01M 10/0525 (2010.01);
U.S. Cl.
CPC ...
H01M 4/668 (2013.01); H01G 11/26 (2013.01); H01G 11/36 (2013.01); H01G 11/54 (2013.01); H01G 11/86 (2013.01); H01M 4/0404 (2013.01); H01M 10/0525 (2013.01); H01M 2220/30 (2013.01);
Abstract

An exemplary embodiment of the present invention provides a manufacturing method of an electrode structure for an energy storage device, the method including: forming a polymer substrate configured to have a first uneven pattern on a first surface; forming an electrode active material layer on the first uneven pattern in a state that an tensile force is applied to the polymer substrate; and forming a second uneven pattern on the polymer substrate and the electrode active material layer by removing the tensile force.


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