The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2018

Filed:

Mar. 08, 2017
Applicant:

Raytheon Company, Waltham, MA (US);

Inventors:

Kamal Tabatabaie-Alavi, Sharon, MA (US);

Kezia Cheng, Lowell, MA (US);

Christopher J. MacDonald, Medford, MA (US);

Assignee:

Raytheon Company, Waltham, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/80 (2006.01); H01L 29/47 (2006.01); H01L 21/285 (2006.01); H01L 29/20 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/475 (2013.01); H01L 21/28581 (2013.01); H01L 29/2003 (2013.01); H01L 29/7839 (2013.01);
Abstract

A Schottky contact structure for a semiconductor device having a Schottky contact and an electrode for the contact structure disposed on the contact. The Schottky contact comprises: a first layer of a first metal in Schottky contact with a semiconductor; a second layer of a second metal on the first layer; a third layer of the first metal on the second layer; and a fourth layer of the second metal on the third layer. The electrode for the Schottky contact structure disposed on the Schottky contact comprises a third metal, the second metal providing a barrier against migration between the third metal and the first metal.


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