The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2018

Filed:

Mar. 30, 2017
Applicant:

Fuji Electric Co., Ltd., Kanagawa, JP;

Inventors:

Isamu Sugai, Matsumoto, JP;

Takeyoshi Nishimura, Matsumoto, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/66 (2006.01); H01L 29/10 (2006.01); H01L 29/78 (2006.01); H01L 21/265 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0634 (2013.01); H01L 21/26513 (2013.01); H01L 29/1095 (2013.01); H01L 29/66734 (2013.01); H01L 29/7813 (2013.01);
Abstract

To provide a semiconductor device having a structure capable of forming a superjunction with less thermal history, a semiconductor device is provided, the semiconductor device including a contact trench formed between two gate trenches, penetrating through a source region, and including its lower end arranged in a base region, and a second conductivity-type protruding portion formed protruding toward a lower side from the lower end of the base region in a region opposite to the lower end of the contact trench, wherein the depth from the upper end of the source region to a lower end of the protruding portion is 3 μm or more, and a carrier concentration Nd in a first conductivity-type region adjacent to the protruding portion in a lateral direction perpendicular to a depth direction and a carrier concentration Na of the protruding portion satisfy a predetermined equation.


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