The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2018
Filed:
Jun. 20, 2017
Canon Kabushiki Kaisha, Tokyo, JP;
Tomoyuki Tezuka, Sagamihara, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method for manufacturing a solid state image pickup apparatus, including the steps of forming, by removing part of an insulating layer by using a first mask, a first contact opening on an impurity region, and a second contact opening over a compound layer such that a first portion, which covers the compound layer, of the insulating layer is exposed at a bottom of the second contact opening, and ion-implanting an impurity into the impurity region through the first contact opening while the first portion covering the compound layer is exposed at the second contact opening, wherein the impurity region is disposed in a pixel region including a photoelectric conversion unit, and the compound layer is disposed on at least one of a gate electrode, a drain region, and a source region of a transistor disposed in a peripheral circuit region and is composed of a metal and a semiconductor.