The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2018

Filed:

Jun. 15, 2016
Applicant:

Coorstek Kk, Tokyo, JP;

Inventor:

Takeshi Ogitsu, Yamagata, JP;

Assignee:

COORSTEK KK, Shinagawa-Ku, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/02 (2006.01); H01L 21/673 (2006.01); C23C 16/32 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01); B24C 1/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67306 (2013.01); B24C 1/06 (2013.01); C23C 16/325 (2013.01); C23C 16/4404 (2013.01); C23C 16/4581 (2013.01);
Abstract

A wafer boat supporting a silicon wafer to be processed provides a sufficient anchor effect between a deposit film and a SiC coating film formed on a base material, and suppresses generation of particles due to peeling off of the deposit film. The vertical wafer boat includes a plurality of columns, being made of SiC-based material having a SiC coating film on a surface thereof, which contains shelf plate portions for supporting wafers, and a top plate and a bottom plate for fixing upper and lower ends of the columns, wherein a supporting plane which is in contact with an outer peripheral portion of the wafer is provided on an upper surface of the shelf plate portion, and a surface roughness Ra of a lower surface of the shelf plate increases toward a front side of the shelf plate portion from a rear side.


Find Patent Forward Citations

Loading…