The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2018

Filed:

Sep. 30, 2015
Applicant:

X Development Llc, Mountain View, CA (US);

Inventors:

Ethan Rublee, Mountain View, CA (US);

Hauke Malte Strasdat, San Francisco, CA (US);

Assignee:

X Development LLC, Mountain View, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G01B 11/25 (2006.01);
U.S. Cl.
CPC ...
G06F 17/50 (2013.01); G01B 11/254 (2013.01);
Abstract

Methods and systems for using projected patterns to facilitate mapping of an environment are provided herein. A computing system may cause fixedly-posed projectors to each provide, onto a respective area of the environment, a predetermined respective distinct pattern. The system may determine respective poses of the projectors, and further determine a map of the environment that identifies, for each distinct pattern, respective locations on one or more surfaces in the environment on which the distinct pattern is detectable. Based on sensor data the system may identify a portion of a particular distinct pattern in the environment. The system may use the map and the respective pose of a particular projector that is providing the particular pattern to make a determination that the portion is located at a new, different location compared to the map. The system may then transmit an output signal indicating the determination.


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