The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2018
Filed:
Jul. 15, 2016
Applicant:
Pixelteq, Inc., Largo, FL (US);
Inventors:
Heather Lovelady, Largo, FL (US);
Ronnie Varghese, Palm Harbor, FL (US);
Assignee:
Ocean Optics, Inc., Largo, FL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3105 (2006.01); G03F 7/16 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/168 (2013.01); H01L 21/0272 (2013.01);
Abstract
A single lithography process for multi-layer metal/dielectric coatings using a series of developing, baking, and lifting steps to coat two or more thin films without re-patterning that results in the encapsulation and profile optimization of multi-spectral patterned thin film coatings is disclosed.
Quick Actions:
Lovelady, Heather. (2018). Lithography process for the encapsulation of patterned thin film coatings (U.S. Patent No. 10025189). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10025189
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile