The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2018

Filed:

Sep. 12, 2014
Applicant:

Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Inventors:

Jean-Paul Garandet, Le Bourget du Lac, FR;

Denis Camel, Chambery, FR;

Béatrice Drevet, Grenoble, FR;

Nicolas Eustathopoulos, Grenoble, FR;

Charles Huguet, Paris, FR;

Johann Testard, Veyrier du Lac, FR;

Rayisa Voytovych, Echriolles, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C04B 35/14 (2006.01); C30B 11/00 (2006.01); C04B 41/89 (2006.01); C04B 41/00 (2006.01); C04B 41/52 (2006.01); C30B 29/06 (2006.01); C30B 35/00 (2006.01); B05D 7/00 (2006.01); C01B 33/021 (2006.01); C04B 111/00 (2006.01);
U.S. Cl.
CPC ...
C30B 11/002 (2013.01); B05D 7/50 (2013.01); C01B 33/021 (2013.01); C04B 41/009 (2013.01); C04B 41/52 (2013.01); C04B 41/89 (2013.01); C30B 29/06 (2013.01); C30B 35/002 (2013.01); C04B 2111/00879 (2013.01);
Abstract

A substrate, in particular intended for contact with liquid silicon, wherein it is at least partially surface-coated with a multilayer coating formed by: at least one layer, known as the adhesion layer, contiguous with the substrate, having an open porosity of at least 30%, and formed of a material comprising silica and silicon nitride, said material having a silica content of between 10 wt.-% and 55 wt.-% in relation to the total weight thereof; and a layer different from the adhesion layer, known as the release layer, located on the surface of the adhesion layer and formed of a material including silica and silicon nitride, said material having a silica content of between 2 wt.-% and 10 wt.-% in relation to the total weight thereof.


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