The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2018
Filed:
Dec. 16, 2015
Applicant:
Arkema France, Colombes, FR;
Inventors:
Assignee:
Arkema France, Colombes, FR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 297/02 (2006.01); C09D 153/00 (2006.01); G03F 7/00 (2006.01); G03F 7/004 (2006.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
C08F 297/026 (2013.01); B82Y 30/00 (2013.01); C09D 153/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/004 (2013.01); B81C 2201/0149 (2013.01);
Abstract
A method for controlling the synthesis of a block copolymer containing at least two blocks, with at least one nonpolar block and at least one polar block, said method making it possible in particular to control the ratio between the blocks and the molecular weight of each of the blocks, said copolymer being a block copolymer intended to be used as a mask in a method of nanolithography by direct self-assembly (DSA), said control being achieved by semicontinuous anionic polymerization in an aprotic nonpolar medium.