The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2018

Filed:

Jan. 04, 2013
Applicant:

Ut-battelle, Llc, Oak Ridge, TN (US);

Inventors:

Ivan V. Vlassiouk, Oak Ridge, TN (US);

Sergei N. Smirnov, Las Cruces, NM (US);

William H. Peter, Knoxville, TN (US);

Adrian S. Sabau, Knoxville, TN (US);

Sheng Dai, Knoxville, TN (US);

Pasquale F. Fulvio, Oak Ridge, TN (US);

Ilia N. Ivanov, Knoxville, TN (US);

Nickolay V. Lavrik, Knoxville, TN (US);

Panagiotis G. Datskos, Knoxville, TN (US);

Assignee:

UT-Battelle, LLC, Oak Ridge, TN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/26 (2006.01); C01B 31/04 (2006.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01); C01B 32/186 (2017.01);
U.S. Cl.
CPC ...
C01B 31/0453 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); C01B 32/186 (2017.08); C23C 16/26 (2013.01); C01B 2204/32 (2013.01); Y10T 156/10 (2015.01);
Abstract

Systems and methods for synthesizing continuous graphene sheets are provided. The systems and methods include passing a catalyst substrate through a heated chemical vapor deposition chamber and exposing the substrate to a reaction gas mixture of hydrogen and hydrocarbon at a preselected location within the chamber. The reaction gas mixture can include hydrogen having a partial pressure of between about 0 Torr and 20 Torr, hydrocarbon having a partial pressure of between about 20 mTorr and about 10 Torr, and one or more buffer gases. The buffer gases can include argon or other noble gases to maintain atmospheric pressure within the chemical deposition chamber. The resulting graphene can be made with continuous mono and multilayers (up to six layers) and have single crystalline hexagonal grains with a preselected nucleation density and domain size for a range of applications.


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