The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2018
Filed:
Jun. 12, 2015
Fasver, Baillargues, FR;
FASVER, Baillargues, FR;
Abstract
Disclosed is a method for manufacturing a multilayer data medium having reflecting metallized inscriptions () visible from at least one outer surface (). A basic pattern () is imprinted onto a transparent impression layer (), the pattern being selected so as to be able to receive the inscriptions (), to be transparent and to have a surface tension of more than 40 dynes/cm and a smooth surface condition with specular reflection of more than 50% measured according to the ISO 2813 standard at an angle of 60°, and no glass-transition temperature in the rolling temperature range; then the inscriptions () are imprinted in contact with the basic pattern (), and then hot rolling under pressure of a stack including the impression layer () is carried out.