The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2018

Filed:

Sep. 23, 2015
Applicant:

Semes Co., Ltd., Cheonan-si, Chungcheongnam-do, KR;

Inventors:

Sul Lee, Incheon, KR;

Young Hun Jung, Cheonan-si, KR;

Jong Su Choi, Asan-si, KR;

Assignee:

Semes Co., Ltd., Chungcheongam-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/00 (2006.01); H01L 21/67 (2006.01); B05D 1/02 (2006.01);
U.S. Cl.
CPC ...
B05D 1/002 (2013.01); B05D 1/02 (2013.01); H01L 21/6708 (2013.01);
Abstract

In apparatus and method according to example embodiments of the inventive concept, a substrate may be treated using two or more treatment solutions. The substrate treating apparatus may include a treatment vessel providing a treatment space, a substrate supporting unit provided in the treatment vessel to support a substrate, and a solution supplying unit supplying a treatment solution on the substrate supported by the substrate supporting unit. The solution supplying unit may include an etching solution supplying nozzle supplying an etching solution on an edge region of the substrate supported by the substrate supporting unit and an etch prevention solution (EPS) supplying nozzle supplying an etch prevention solution on a center region of the substrate supported by the substrate supporting unit. Accordingly, it is possible to prevent the center region of the substrate from being dried.


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