The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2018
Filed:
Jan. 10, 2017
Robert Bosch Gmbh, Stuttgart, DE;
Arnd Kaelberer, Schlierbach, DE;
Christian Zielke, Eningen Unter Achalm, DE;
Hans Artmann, Boeblingen-Dagersheim, DE;
Oliver Breitschaedel, Gomaringen, DE;
Peter Borwin Staffeld, Stuttgart, DE;
ROBERT BOSCH GMBH, Stuttgart, DE;
Abstract
An etching device and an etching method. The etching device includes an etching chamber and a chuck located therein for clamping a substrate to be etched, a plasma generating device surrounding the etching chamber in an area and a gas nozzle distribution device for introducing etching gas, which is situated above the chuck in such a way that an etching gas stream is directed essentially perpendicular to a surface of the substrate to be etched. A moving mechanism may be used to change the distance between the gas nozzle distribution device and the chuck as a function of the etching mode.